Please use this identifier to cite or link to this item: https://repositorio.fei.edu.br/handle/FEI/1060
Title: Cryogenic operation of graded-channel silicon-on-insulator nMOSFETs for high performance analog applications
Authors: PAVANELLO, Marcelo A.
AGOPIAN, Paula Ghedini Der
MARTINO, João Antonio
FLANDRE, Denis
Issue Date: 2006
Journal: Microelectronics Journal
ISSN: 0026-2692
Citation: PAVANELLO, Marcelo A.; AGOPIAN, Paula Ghedini Der; MARTINO, João Antonio; FLANDRE, Denis. Cryogenic operation of graded-channel silicon-on-insulator nMOSFETs for high performance analog applications. Microelectronics Journal, v. 37, n. 2, p. 137-144, 2006.
Access Type: Acesso Aberto
DOI: 10.1016/j.mejo.2005.04.046
URI: https://repositorio.fei.edu.br/handle/FEI/1060
Appears in Collections:Artigos

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.