Using diamond layout style to boost MOSFET frequency response of analogue IC
Nenhuma Miniatura disponível
Citações na Scopus
22
Tipo de produção
Artigo
Data
2014
Autores
Gimenez S.P.
Leoni R.D.
Renaux C.
Flandre D.
Leoni R.D.
Renaux C.
Flandre D.
Orientador
Periódico
Electronics Letters
Título da Revista
ISSN da Revista
Título de Volume
Citação
GIMENEZ, S.P.; RENAUX, C.; LEONI, R.D.; FLANDRE, D.. Using diamond layout style to boost MOSFET frequency response of analogue IC. Electronics Letters, v. 50, n. 5, p. 398-400, 2014.
Texto completo (DOI)
Palavras-chave
Resumo
A way to improve the metal-oxide-semiconductor field effect transistor (MOSFET) analogue electrical performance, still little explored, is to modify their aspect form or ratio (AR) by the use of innovative layout styles. The diamond MOSFET (DM) is an example of this approach. It presents hexagonal gate geometry. This new layout structure for MOSFET induces two additional effects in comparison with the conventional (i.e. rectangular gate geometry) MOSFET (CM) counterpart, which improves the device's electrical performance: the longitudinal corner effect (LCE) and parallel association of MOSFET with different channel length effect (PAMDLE). How the diamond layout style (DLS) can significantly enhance the device's frequency response (FR) by using two different integrated circuits' (IC) complementary metal-oxide-semiconductor (CMOS) manufacturing process technologies (bulk and silicon-on-insulator (SOI)) is demonstrated. © 2014 The Institution of Engineering and Technology.