Study of matching properties of graded-channel SOI MOSFETs
N/D
Tipo de produção
Artigo
Data de publicação
2008-01-05
Periódico
Journal of Integrated Circuits and Systems
Editor
Texto completo na Scopus
Citações na Scopus
8
Autores
Michelly De Souza
FLANDRE, D.
Marcelo Antonio Pavanello
Orientadores
Resumo
In this paper an overall analysis on the matching properties of Graded-Channel (GC) SOI MOSFETs in comparison to conventional SOI transistors is performed. Experimental results show that GC devices present poorer matching behavior in comparison to conventional SOI counterpart for equal mask channel length, whereas for same effective channel length, almost the same matching behavior. The analytical model for the drain current of GC devices is used to investigate the reasons for this matching worsening. Two-dimensional numerical simulations are used to validate the model-based analysis both in linear and saturation regions.
Citação
DE SOUZA, M.; FLANDRE, D.; PAVANELLO, M. A. Study of matching properties of graded-channel SOI MOSFETs. Journal of Integrated Circuits and Systems, v. 3, n. 2, p. 69-75, 2008.
Palavras-chave
Keywords
Charge-based model; Graded-channel; Mismatch; MOSFET; Silicon-on-insulator