Uniaxial mechanical stress influence on the low frequency noise in FD SOI nMOSFETs operating in saturation

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dc.contributor.authorDE SAOUZA, M. A. S.
dc.contributor.authorCLAEYS, C.
dc.contributor.authorRodrido Doria
dc.contributor.authorMarcelo Antonio Pavanello
dc.contributor.authorSIMOEN, E.
dc.contributor.authorOrcidhttps://orcid.org/0000-0003-1361-3650
dc.contributor.authorOrcidhttps://orcid.org/0000-0003-4448-4337
dc.date.accessioned2022-01-12T22:02:32Z
dc.date.available2022-01-12T22:02:32Z
dc.date.issued2012-03-17
dc.description.abstractThis work presents a study of the influence of mechanical stress on the low frequency noise in planar SOI transistors operating in saturation. Several channel lengths were measured, and the results show a reduction of the low frequency noise for strained devices independent of the channel length, and this reduction is more effective for smaller channel lengths. © 2012 IEEE.
dc.identifier.citationDE SAOUZA, M. A. S.; CLAEYS, C.; DORIA, R.; PAVANELLO, M. A.; SIMOEN, E. Uniaxial mechanical stress influence on the low frequency noise in FD SOI nMOSFETs operating in saturation, March, 2012.
dc.identifier.doi10.1109/ICCDCS.2012.6188929
dc.identifier.urihttps://repositorio.fei.edu.br/handle/FEI/4142
dc.relation.ispartof2012 8th International Caribbean Conference on Devices, Circuits and Systems, ICCDCS 2012
dc.rightsAcesso Restrito
dc.subject.otherlanguageLow frequency noise
dc.subject.otherlanguagePlanar SOI
dc.subject.otherlanguageSCESL
dc.subject.otherlanguageUniaxial mechanical stress
dc.titleUniaxial mechanical stress influence on the low frequency noise in FD SOI nMOSFETs operating in saturation
dc.typeArtigo de evento
fei.scopus.citations0
fei.scopus.eid2-s2.0-84860997228
fei.scopus.subjectChannel length
fei.scopus.subjectLow-Frequency Noise
fei.scopus.subjectMechanical stress
fei.scopus.subjectPlanar SOI
fei.scopus.subjectSCESL
fei.scopus.subjectSOI n-MOSFETs
fei.scopus.subjectSOI transistors
fei.scopus.subjectUni-axial mechanical stress
fei.scopus.updated2024-07-01
fei.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84860997228&origin=inward
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