Substrate bias influence on the operation of junctionless nanowire transistors

dc.contributor.authorTrevisoli R.
dc.contributor.authorDoria R.T.
dc.contributor.authorDe Souza M.
dc.contributor.authorPavanello M.A.
dc.date.accessioned2019-08-19T23:45:13Z
dc.date.available2019-08-19T23:45:13Z
dc.date.issued2014
dc.description.abstractThe aim of this paper is to analyze the substrate bias influence on the operation of junctionless nanowire transistors based on 3-D simulated and experimental results, accomplished by modeled data. The threshold voltage, the maximum transconductance, the subthreshold slope, the drain-induced barrier lowering (DIBL), and the ION/IOFF ratio are the key parameters under analysis. It has been shown that the negative back bias can reduce the short-channel effects occurrence, improving the ION/ OFF ratio and DIBL. © 1963-2012 IEEE.
dc.description.firstpage1575
dc.description.issuenumber5
dc.description.lastpage1582
dc.description.volume61
dc.identifier.citationTREVISOLI, Renan Doria; DORIA, Rodrigo Trevisoli; DE SOUZA, Michelly; PAVANELLO, Marcelo A.. Substrate Bias Influence on the Operation of Junctionless Nanowire Transistors. IEEE Transactions on Electron Devices, v. 61, n. 5, p. 1575-1582, 2014.
dc.identifier.doi10.1109/TED.2014.2309334
dc.identifier.issn0018-9383
dc.identifier.urihttps://repositorio.fei.edu.br/handle/FEI/1142
dc.relation.ispartofIEEE Transactions on Electron Devices
dc.rightsAcesso Restrito
dc.subject.otherlanguageJunctionless transistors
dc.subject.otherlanguagemaximum transconductance
dc.subject.otherlanguagesubstrate bias
dc.subject.otherlanguagesubthreshold slope
dc.subject.otherlanguagethreshold voltage
dc.titleSubstrate bias influence on the operation of junctionless nanowire transistors
dc.typeArtigo
fei.scopus.citations36
fei.scopus.eid2-s2.0-84899907606
fei.scopus.subjectBack bias
fei.scopus.subjectDrain-induced barrier lowering
fei.scopus.subjectJunctionless transistors
fei.scopus.subjectMaximum transconductance
fei.scopus.subjectNanowire transistors
fei.scopus.subjectShort-channel effect
fei.scopus.subjectSubstrate bias
fei.scopus.subjectSubthreshold slope
fei.scopus.updated2024-02-01
fei.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84899907606&origin=inward
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