Analysis of Fin Width Influence on the Carrier's Mobility of Nanowire MOSFETs

dc.contributor.advisorOrcidhttps://orcid.org/0000-0003-1361-3650
dc.contributor.authorCCOTO, C. U. C.
dc.contributor.authorBERGAMASHI, F. E.
dc.contributor.authorMarcelo Antonio Pavanello
dc.date.accessioned2023-06-01T06:09:39Z
dc.date.available2023-06-01T06:09:39Z
dc.date.issued2021-08-31
dc.description.abstract©2021 IEEE.In this work, the study of the effective electron mobility (peff) of n-channel MOS transistor nanowires is presented. By extracting the mobility of the top and sidewall using the surface current separation technique together with the split-CV method. Analyzing the comparison of simulated TCAD results and experimental transistors fabricated with various fin widths (12nm-82nm) and how the effect of varying the fin width and applied substrate voltages interfere with carrier mobility values.
dc.identifier.citationCCOTO, C. U. C.; BERGAMASHI, F. E.; PAVANELLO, M. A. Analysis of Fin Width Influence on the Carrier's Mobility of Nanowire MOSFETs. SBMicro 2021 - 35th Symposium on Microelectronics Technology and Devices, aug. 2021.
dc.identifier.doi10.1109/SBMicro50945.2021.9585753
dc.identifier.urihttps://repositorio.fei.edu.br/handle/FEI/4814
dc.relation.ispartofSBMicro 2021 - 35th Symposium on Microelectronics Technology and Devices
dc.rightsAcesso Restrito
dc.subject.otherlanguageEffective mobility
dc.subject.otherlanguageHybrid orientation
dc.subject.otherlanguageMobility extraction
dc.subject.otherlanguageNanowire
dc.subject.otherlanguageSplit-cv
dc.titleAnalysis of Fin Width Influence on the Carrier's Mobility of Nanowire MOSFETs
dc.typeArtigo de evento
fei.scopus.citations1
fei.scopus.eid2-s2.0-85126148023
fei.scopus.subjectEffective electron mobility
fei.scopus.subjectEffective mobilities
fei.scopus.subjectFin widths
fei.scopus.subjectHybrid orientation
fei.scopus.subjectMobility extraction
fei.scopus.subjectN-channel
fei.scopus.subjectNanowire MOSFETs
fei.scopus.subjectSeparation techniques
fei.scopus.subjectSplit-cv
fei.scopus.subjectSurface current
fei.scopus.updated2025-01-01
fei.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85126148023&origin=inward
Files
Collections