Description and characterization of a ECR plasma device developed for thin film deposition

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dc.contributor.authorDA MATTA, J. A. S.
dc.contributor.authorGALVAO, R. M. O.
dc.contributor.authorRUCHKO, L.
dc.contributor.authorFANTINI, M. C. A.
dc.contributor.authorKIUOHARA, P. K.
dc.date.accessioned2022-01-12T22:06:02Z
dc.date.available2022-01-12T22:06:02Z
dc.date.issued2003-03-05
dc.description.abstractThe design, construction, and characterization of an electron-cyclotron-resonance (ECR) plasma device and its utilization for growing AlN polycrystals are described in detail. The plasma density and electron temperature were measured by two types of Langmuir probes under different conditions of magnetic configuration and RF substrate polarization. For the investigated nitrogen plasmas, the electron temperature increases towards substrate holder and decreases with pressure. The magnetic configuration and plasma parameters required for successful growth of polycrystal aluminum nitride have been determined.
dc.description.firstpage123
dc.description.issuenumber1
dc.description.lastpage127
dc.description.volume33
dc.identifier.citationDA MATTA, J. A. S.; GALVAO, R. M. O.; RUCHKO, L.; FANTINI, M. C. A.; KIUOHARA, P. K. Description and characterization of a ECR plasma device developed for thin film deposition. Brazilian Journal of Physics, v. 33, n. 1, p. 123-127, March, 2003.
dc.identifier.doi10.1590/s0103-97332003000100011
dc.identifier.issn0103-9733
dc.identifier.urihttps://repositorio.fei.edu.br/handle/FEI/4380
dc.relation.ispartofBrazilian Journal of Physics
dc.rightsAcesso Aberto
dc.rights.licenseCreative Commons "Este é um artigo publicado em acesso aberto sob uma licença Creative commons (CC BY 4.0). Fonte: https://www.scielo.br/j/bjp/a/xWC4gTpprnjSRqVmR9f76SJ/?lang=en. Acesso em: 20 junho 2022.
dc.titleDescription and characterization of a ECR plasma device developed for thin film deposition
dc.typeArtigo
fei.scopus.citations6
fei.scopus.eid2-s2.0-0038739552
fei.scopus.updated2024-07-01
fei.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=0038739552&origin=inward
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