CORREIA, M. M.BELLODI, M.2022-01-122022-01-122012CORREIA, M. M.; BELLODI, M. Drain leakage current in Δ-channel SOI nMOSFET operating at high temperatures. ECS Transactions, v. 45, n. 7, p. 209-220, May. 2012.1938-6737https://repositorio.fei.edu.br/handle/FEI/4166This paper presents the electric behavior of Δ-channel SOI nMOSFET transistors (triangular channel), as a function of the channel geometric dimensions, such as the channel length (L) and the internal angle (θ) of the triangular structure, in the drain leakage current (IDleak) behavior, for these devices operating from room temperature up to 300°C. Through three-dimensional numeric simulations it was observed that I Dleak is composed mainly by electrons, in all analyzed devices operating at high temperatures. Besides that, as L reduces, it was noticed that IDleak increases. However, for smaller angles θ, results smaller IDleak values, when the transistors are operating at same bias and temperature conditions. ©The Electrochemical Society.Acesso RestritoArtigo de evento10.1149/1.3701541