Renato GiacominiMARINO, J. A.2023-08-262023-08-262004-09-07GIACOMINI, R.; MARINO, J. A. An improved model for the triangular SOI misalignment test structure. Proceedings - Electrochemical Society, v. 3, p. 57-62, sept. 2023.https://repositorio.fei.edu.br/handle/FEI/5067The triangular misalignment test structure is an arrangement of MOS transistors to calculate the poly and source/drain diffusion misalignment as a function of drain current differences. Although these structures have non-rectangular shapes, which may be detrimental for the design, the advantage of measuring currents instead of voltage differences make them very useful. This work presents a new analytic misalignment error model for thin-film, fully depleted SOI technology, using non rectangular devices. Three-dimensional numerical simulation is used as a reference for models comparison and verification. These simulation results show that the proposed analytical model presents an improved performance compared to those available in the literature.Acesso RestritoAn improved model for the triangular SOI misalignment test structureArtigo de evento