Origin of the low-frequency noise in the asymmetric self-cascode structure composed by fully depleted SOI nMOSFETs

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dc.contributor.authorASSALTI, R.
dc.contributor.authorRodrigo Doria
dc.contributor.authorFLANDRE, D.
dc.contributor.authorMichelly De Souza
dc.contributor.authorOrcidhttps://orcid.org/0000-0003-4448-4337
dc.contributor.authorOrcidhttps://orcid.org/0000-0001-6472-4807
dc.date.accessioned2023-08-26T23:48:10Z
dc.date.available2023-08-26T23:48:10Z
dc.date.issued2017-08-05
dc.description.abstract© 2017, Brazilian Microelectronics Society. All rights reserved.In this paper the origin of low-frequency noise in the Asymmetric Self-Cascode (A-SC) structure composed by Fully Depleted SOI nMOSFETs is investigated through experimental results. It is shown that the predominant noise source of the A-SC structure is linked to carrier number fluctuations, being governed by the noise generated in the transistor near the source. Larger channel doping concentrations degrade the quality of the Si-SiO2 interface and the gate oxide, which causes an increase of the normalized drain current noise spectral density, just as the reduction of the gate voltage overdrive, since there are few carriers in the channel. The A-SC structures have showed higher noise compared with single transistors. In saturation regime, the increase of the gate voltage overdrive has incremented the corner frequency, shifting the g-r noise to higher frequencies. Besides that, the normalized noise has been significantly increased when compared with the linear regime due to the rise of the drain current noise spectral density.
dc.description.firstpage62
dc.description.issuenumber2
dc.description.lastpage70
dc.description.volume12
dc.identifier.citationASSALTI, R.; DORIA, R.; FLANDRE, D.; DE SOUZA, M. Origin of the low-frequency noise in the asymmetric self-cascode structure composed by fully depleted SOI nMOSFETs. Journal of Integrated Circuits and Systems, v. 12, n. 2, p. 62-70, aug. 2017.
dc.identifier.issn1872-0234
dc.identifier.urihttps://repositorio.fei.edu.br/handle/FEI/4893
dc.relation.ispartofJournal of Integrated Circuits and Systems
dc.rightsAcesso Restrito
dc.subject.otherlanguageAsymmetric self-cascode
dc.subject.otherlanguageFD SOI nMOSFET
dc.subject.otherlanguageLow-frequency noise
dc.subject.otherlanguageTrap density
dc.titleOrigin of the low-frequency noise in the asymmetric self-cascode structure composed by fully depleted SOI nMOSFETs
dc.typeArtigo
fei.scopus.citations1
fei.scopus.eid2-s2.0-85040032921
fei.scopus.updated2024-07-01
fei.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85040032921&origin=inward
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