Repositório do Conhecimento Institucional do Centro Universitário FEI
 

Engenharia Elétrica

URI permanente desta comunidadehttps://repositorio.fei.edu.br/handle/FEI/21

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Resultados da Pesquisa

Agora exibindo 1 - 2 de 2
  • Artigo 6 Citação(ões) na Scopus
    Thermal cross-coupling effects in side-by-side UTBB-FDSOI transistors
    (2021-11-05) COSTA, F. J.; TREVISOLI, R.; Rodrigo Doria
    © 2021 Elsevier LtdThe focus of this work is to perform a first-time analysis of the thermal cross-coupling of a device on a neighbor one in advanced UTBB transistors through 3D numerical simulations, validated with experimental data from the literature. In this work, it could be observed that the temperature rise due to a self-heated device can affect the performance of a neighbor one according to the distance between them and to the bias conditions. By varying the distance of the devices from 1 µm to 50 nm, it is shown an influence of the temperature rise due to a self-heated device in threshold voltage, subthreshold swing and in the maximum transconductance as well an increase in the thermal resistance of a neighbor device.
  • Artigo 4 Citação(ões) na Scopus
    Influence of interface traps density and temperature variation on the NBTI effect in p-Type junctionless nanowire transistors
    (2021-12-05) GRAZIANO, N.; COSTA, F. J.; TREVISOLI, R.; BARRAUD, S.; Rodrigo Doria
    © 2021 Elsevier LtdThis paper deals with the behavior of degradation by NBTI effect in pMOS junctionless nanowire transistors (JNTs). The analysis has been performed through measurements followed by 3D numerical simulations and has shown that the increase in the oxygen precursors density close to the interface leads to the reduction of the saturation in the NBTI effect when the devices operate in partial depletion regime. Such effect can be associated to the change in the flatband voltage to more negative values as well as the threshold voltage with the increase in the precursor density. In the sequence of the work, it was shown that, as the operation temperature rises, there is an increase in the degradation of the threshold voltage due to NBTI, which is more pronounced for larger gate voltages. It was concluded that this effect could be associated to the increase in the recombination rate with the temperature, which enables the occupation of a larger amount of traps.