Analog performance of submicron GC SOI MOSFETs
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Tipo de produção
Artigo de evento
Data de publicação
2012-03-17
Texto completo (DOI)
Periódico
2012 8th International Caribbean Conference on Devices, Circuits and Systems, ICCDCS 2012
Editor
Texto completo na Scopus
Citações na Scopus
4
Autores
NEMER J. P.
Michelly De Souza
Marcelo Antonio Pavanello
FLANDRE, D.
Orientadores
Resumo
This paper aims to demonstrate the performance of GC SOI MOSFET devices in comparison to standard SOI MOS transistors, comparing the improvements achieved by the adoption of the GC architecture in a submicron fully depleted SOI technology varying the channel length. The results obtained by two-dimensional numerical simulations show that the best improvement is obtained when the length of lightly doped region length is approximately 100 nm, independently of the total channel length. © 2012 IEEE.
Citação
NEMER J. P.; DE SOUZA, M.; PAVANELLO, M. A. ; FLANDRE, D. Analog performance of submicron GC SOI MOSFETs. 2012 8th International Caribbean Conference on Devices, Circuits and Systems, ICCDCS 2012, March, 2012.
Palavras-chave
Keywords
analog performance; GC SOI MOSFETs; submicron devices
Assuntos Scopus
Analog performance; Channel length; Fully depleted SOI; SOI-MOSFETs; Submicron; Submicron devices; Two-dimensional numerical simulation