Influence of fin width and back bias on the low-frequency noise of long channel SOI nanowires

Página do item simplificado
dc.contributor.authorMOLTO, A.R.
dc.contributor.authorPAZ, B. C.
dc.contributor.authorMarcelo Antonio Pavanello
dc.contributor.authorOrcidhttps://orcid.org/0000-0003-1361-3650
dc.date.accessioned2022-01-12T21:56:26Z
dc.date.available2022-01-12T21:56:26Z
dc.date.issued2019-05-19
dc.description.abstractThis work studies the influence of fin width and back bias on the low-frequency noise of long channel fully depleted SOI nanowires. Devices with fin widths of 20nm, 45nm and 105nm were studied under different back bias (Vsub) conditions, varying Vsub from-40V to 40V. Nanowires operate in linear regime with gate voltage overdrive varying from OmV to 200mV. Results show low-frequency noise increase for both positive and negative back bias for long channel devices. For the input referred noise power spectral density as a function of Wfin,it was possible to observe a slight increase of SVG with Wfindecrease.
dc.identifier.citationMOLTO, A.R.; PAZ, B. C. Influence of fin width and back bias on the low-frequency noise of long channel SOI nanowires. Latin American Electron Devices Conference, LAEDC 2019, Mayo, 2019.
dc.identifier.doi10.1109/LAED.2019.8714739
dc.identifier.urihttps://repositorio.fei.edu.br/handle/FEI/3725
dc.relation.ispartofLatin American Electron Devices Conference, LAEDC 2019
dc.rightsAcesso Restrito
dc.subject.otherlanguageBack bias
dc.subject.otherlanguageFully depleted SOI
dc.subject.otherlanguagelow-frequency noise
dc.subject.otherlanguageNanowire
dc.titleInfluence of fin width and back bias on the low-frequency noise of long channel SOI nanowires
dc.typeArtigo de evento
fei.scopus.citations0
fei.scopus.eid2-s2.0-85067177410
fei.scopus.subjectBack bias
fei.scopus.subjectFully depleted SOI
fei.scopus.subjectGate voltages
fei.scopus.subjectLinear regime
fei.scopus.subjectLong channel devices
fei.scopus.subjectLow-Frequency Noise
fei.scopus.subjectNoise power spectral density
fei.scopus.subjectWork study
fei.scopus.updated2025-02-01
fei.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85067177410&origin=inward
Arquivos
Coleções
Artigos