Three-dimensional simulation of biaxially strained triple-gate FinFETs: A method to compute the fin width and channel length dependences on device electrical characteristics

Abstract

Strained devices have been the focus of recent research works due to the boost in the carrier mobility providing a drain current enhancement. Consequently, simulating strained transistors become of major importance in order to predict their characteristics. However, the non-uniformity of the stress distribution creates a dependence of the strain on the device dimensions. This dependence cannot be easily considered in a TCAD simulation. This work shows that the definition of an analytical function for the strain components can overcome this drawback in the stress simulation. Maximum transconductance gain was used as the key parameter to compare simulated and experimental data. The results obtained show mat the simulations with the analytical function agree wim the measurements. ©The Electrochemical Society.