An analytical model for the non-linearity of triple gate SOI MOSFETs
dc.contributor.author | Rodrigo Doria | |
dc.contributor.author | MARTINO, J. A. | |
dc.contributor.author | SIMOEN, E. | |
dc.contributor.author | CLAEYS, C. | |
dc.contributor.author | Marcelo Antonio Pavanello | |
dc.contributor.authorOrcid | https://orcid.org/0000-0003-1361-3650 | |
dc.contributor.authorOrcid | https://orcid.org/0000-0003-4448-4337 | |
dc.date.accessioned | 2022-01-12T22:03:22Z | |
dc.date.available | 2022-01-12T22:03:22Z | |
dc.date.issued | 2011-01-05 | |
dc.description.abstract | This work proposes a physically-based analytical model for the non-linearity of Triple-Gate MOSFETs. The model describes the second order harmonic distortion (HD2), usually the major non-linearity source, as a function of the device dimensions, the series resistance, the low field mobility and the mobility degradation factor (θ). The model was applied to transistors of different channel lengths and fin widths and allowed to conclude that θ is the parameter which most contributes for the increase of HD2. The model was validated for both unstrained and strained FinFETs. ©The Electrochemical Society. | |
dc.description.firstpage | 189 | |
dc.description.issuenumber | 5 | |
dc.description.lastpage | 194 | |
dc.description.volume | 35 | |
dc.identifier.citation | DORIA, R.; MARTINO, J. A.; SIMOEN, E.; CLAEYS, C.; PAVANELLO, M. A. An analytical model for the non-linearity of triple gate SOI MOSFETs. ECS Transactions, v. 35, n. 5, p. 189-194, 2011. | |
dc.identifier.doi | 10.1149/1.3570795 | |
dc.identifier.issn | 1938-5862 | |
dc.identifier.uri | https://repositorio.fei.edu.br/handle/FEI/4199 | |
dc.relation.ispartof | ECS Transactions | |
dc.rights | Acesso Restrito | |
dc.title | An analytical model for the non-linearity of triple gate SOI MOSFETs | |
dc.type | Artigo de evento | |
fei.scopus.citations | 0 | |
fei.scopus.eid | 2-s2.0-79960888003 | |
fei.scopus.subject | Analytical model | |
fei.scopus.subject | Channel length | |
fei.scopus.subject | Fin widths | |
fei.scopus.subject | FinFETs | |
fei.scopus.subject | Low field mobility | |
fei.scopus.subject | Mobility degradation | |
fei.scopus.subject | Non-Linearity | |
fei.scopus.subject | Second orders | |
fei.scopus.subject | Series resistances | |
fei.scopus.subject | SOI-MOSFETs | |
fei.scopus.subject | Triple-gate | |
fei.scopus.subject | Triple-gate MOSFETs | |
fei.scopus.updated | 2024-07-01 | |
fei.scopus.url | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=79960888003&origin=inward |