Artigos
URI permanente para esta coleçãohttps://repositorio.fei.edu.br/handle/FEI/798
Navegar
5 resultados
Resultados da Pesquisa
- Substrate bias influence on the operation of junctionless nanowire transistors(2014) Trevisoli R.; Doria R.T.; De Souza M.; Pavanello M.A.The aim of this paper is to analyze the substrate bias influence on the operation of junctionless nanowire transistors based on 3-D simulated and experimental results, accomplished by modeled data. The threshold voltage, the maximum transconductance, the subthreshold slope, the drain-induced barrier lowering (DIBL), and the ION/IOFF ratio are the key parameters under analysis. It has been shown that the negative back bias can reduce the short-channel effects occurrence, improving the ION/ OFF ratio and DIBL. © 1963-2012 IEEE.
- Analytical model for the dynamic behavior of triple-gate junctionless nanowire transistors(2016) Trevisoli R.; Doria R.T.; De Souza M.; Barraud S.; Vinet M.; Pavanello M.A.© 2015 IEEE.This paper presents an analytical model for the intrinsic capacitances and transconductances of triple-gate junctionless nanowire transistors. The model is based on a surface-potential drain current model, which includes shortchannel effects, and accounts for the dependences on the device dimensions, doping concentration, and quantum effects. It is validated with 3-D Technology Computer-Aided Design (TCAD) simulations for several device characteristics and biases as well as with the experimental results.
- Junctionless multiple-gate transistors for analog applications(2011) Doria R.T.; Pavanello M.A.; Trevisoli R.D.; De Souza M.; Lee C.-W.; Ferain I.; Akhavan N.D.; Yan R.; Razavi P.; Yu R.; Kranti A.; Colinge J.-P.This paper presents the evaluation of the analog properties of nMOS junctionless (JL) multigate transistors, comparing their performance with those exhibited by inversion-mode (IM) trigate devices of similar dimensions. The study has been performed for devices operating in saturation as single-transistor amplifiers, and we have considered the dependence of the analog properties on fin width Wfin and temperature T. Furthermore, this paper aims at providing a physical insight into the analog parameters of JL transistors. For that, in addition to device characterization, 3-D device simulations were performed. It is shown that, depending on gate voltage, JL devices can present both larger Early voltage VEA and larger intrinsic voltage gain AV than IM devices of similar dimensions. In addition, VEA and AV are always improved in JL devices when the temperature is increased, whereas they present a maximum value around room temperature for IM transistors. © 2010 IEEE.
- Advantages of the graded-channel SOI FD MOSFET for application as a quasi-linear resistor(2005) Cerdeira A.; Aleman M.A.; Pavanello M.A.; Martino J.A.; Vancaillie L.; Flandre D.In this paper, we analyze the previously unexpected advantages of asymmetric channel engineering on the MOS resistance behavior in quasi-linear operation, such as used in integrated continuous-time tunable filters. The study of the two major figures of merit in such applications as on-resistance and nonlinear harmonic distortion, is supported by both measurements and simulations of conventional and graded-channel (GC) fully depleted silicon-on-insultor (SOI) MOSFETs. The quasi-linear current-voltage characteristics of GC transistors show a decrease of the on-resistance as the length of the low doped region in the channel is increased, as well as an improvement in the third-order harmonic distortion (HD3), when compared with conventional transistors. A method for full comparison between conventional and GC SOI MOSFETs is presented, considering HD3 evolution with on-resistance tuning under low voltage of operation. Results demonstrate the significant advantages provided by the asymmetrical long channel transistors. © 2005 IEEE.
- Analysis of temperature-induced saturation threshold voltage degradation in deep-submicrometer ultrathin SOI MOSFETs(2005) Pavanello M.A.; Martino J.A.; Simoen E.; Claeys C.This paper presents a systematic study of the temperature lowering influence on the saturation threshold voltage degradation in ultrathin deep-submicrometer fully depleted silicon-on-insulator (SOI) MOSFETs. It is observed that the difference between the threshold voltage obtained with low and high drain bias, increases at lower temperatures for nMOSFETs, whereas it is weakly temperature-dependent for pMOSFETs. Experimental results and two-dimensional numerical simulations are used to support the analysis. The influence of applied back gate bias on threshold voltage variation is also studied. It is demonstrated that the higher doping level into the body region provided by the halo ion implantation associated to the floating-body increases both the multiplication factor and the parasitic bipolar gain as the temperature is lowered contributing to the threshold voltage degradation. The absence of halo implantation efficiently improves this degradation. The use of double gate structure, even with high body doping level, suppress the saturation threshold voltage degradation in cryogenic operation. © 2005 IEEE.