Repositório do Conhecimento Institucional do Centro Universitário FEI
 

Engenharia Elétrica

URI permanente desta comunidadehttps://repositorio.fei.edu.br/handle/FEI/21

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Resultados da Pesquisa

Agora exibindo 1 - 5 de 5
  • Artigo 5 Citação(ões) na Scopus
    Variability Modeling in Triple-Gate Junctionless Nanowire Transistors
    (2022-01-05) TREVISOLI, R.; Marcelo Antonio Pavanello; Rodrigo Doria; CAPOVILLA, C.E.; BARRAUD, S.; Michelly De Souza
    IEEEThis work aims at proposing an analytical model for the variability of the threshold voltage and drain current in junctionless nanowire transistors. The model is continuous in all operation regions and has been validated through Monte Carlo simulations using a physically based drain current model and 3-D numerical simulations. A discussion about the influences of each variability source based on the proposed model is carried out. Finally, the modeled results are compared to the experimental data for a fully physical validation.
  • Artigo 93 Citação(ões) na Scopus
    Surface-potential-based drain current analytical model for triple-gate junctionless nanowire transistors
    (2012-01-05) TREVISOLI, R. D.; Rodrido Doria; Michelly De Souza; DAS, S.; FERAIN, I.; Marcelo Antonio Pavanello
    This paper proposes a drain current model for triple-gate n-type junctionless nanowire transistors. The model is based on the solution of the Poisson equation. First, the 2-D Poisson equation is used to obtain the effective surface potential for long-channel devices, which is used to calculate the charge density along the channel and the drain current. The solution of the 3-D Laplace equation is added to the 2-D model in order to account for the short-channel effects. The proposed model is validated using 3-D TCAD simulations where the drain current and its derivatives, the potential, and the charge density have been compared, showing a good agreement for all parameters. Experimental data of short-channel devices down to 30 nm at different temperatures have been also used to validate the model. © 2012 IEEE.
  • Artigo 6 Citação(ões) na Scopus
    Analytical Model for Low-Frequency Noise in Junctionless Nanowire Transistors
    (2020-24-24) TREVISOLI, RENAN; Marcelo Antonio Pavanello; CAPOVILLA, CARLOS EDUARDO; BARRAUD, SYLVAIN; DORIA, RODRIGO TREVISOLI
    This article aims at proposing a compact analytical model for the low-frequency noise (LFN) of junctionless nanowire transistors (JNTs), operating at different bias conditions and temperatures. The model is validated through tridimensional numerical simulations, accounting for different trap configurations, as well as devices with different channel lengths, nanowire widths, and doping concentrations. Experimental results of short-channel junctionless transistors have also been used to demonstrate the model's applicability and accuracy.
  • Artigo 36 Citação(ões) na Scopus
    Substrate bias influence on the operation of junctionless nanowire transistors
    (2014) Trevisoli R.; Doria R.T.; De Souza M.; Pavanello M.A.
    The aim of this paper is to analyze the substrate bias influence on the operation of junctionless nanowire transistors based on 3-D simulated and experimental results, accomplished by modeled data. The threshold voltage, the maximum transconductance, the subthreshold slope, the drain-induced barrier lowering (DIBL), and the ION/IOFF ratio are the key parameters under analysis. It has been shown that the negative back bias can reduce the short-channel effects occurrence, improving the ION/ OFF ratio and DIBL. © 1963-2012 IEEE.
  • Artigo 21 Citação(ões) na Scopus
    Analytical model for the dynamic behavior of triple-gate junctionless nanowire transistors
    (2016) Trevisoli R.; Doria R.T.; De Souza M.; Barraud S.; Vinet M.; Pavanello M.A.
    © 2015 IEEE.This paper presents an analytical model for the intrinsic capacitances and transconductances of triple-gate junctionless nanowire transistors. The model is based on a surface-potential drain current model, which includes shortchannel effects, and accounts for the dependences on the device dimensions, doping concentration, and quantum effects. It is validated with 3-D Technology Computer-Aided Design (TCAD) simulations for several device characteristics and biases as well as with the experimental results.