Repositório do Conhecimento Institucional do Centro Universitário FEI
 

Experimental comparative study between the diamond MOSFET and its conventional counterpart in high temperatures environment

dc.contributor.authorGALEMBECK, E. H. S.
dc.contributor.authorRENAUZ, C.
dc.contributor.authorFLANDRE, D.
dc.contributor.authorSalvador Gimenez
dc.date.accessioned2022-01-12T22:01:42Z
dc.date.available2022-01-12T22:01:42Z
dc.date.issued2013-10-2013
dc.identifier.citationGALEMBECK, E. H. S.; RENAUZ, C.; FLANDRE, D.; GIMENEZ, S. Experimental comparative study between the diamond MOSFET and its conventional counterpart in high temperatures environment. 2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2013, Oct. 2013.
dc.identifier.doi10.1109/S3S.2013.6716568
dc.identifier.urihttps://repositorio.fei.edu.br/handle/FEI/4086
dc.relation.ispartof2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2013
dc.rightsAcesso Restrito
dc.titleExperimental comparative study between the diamond MOSFET and its conventional counterpart in high temperatures environment
dc.typeArtigo de evento
fei.scopus.citations10
fei.scopus.eid2-s2.0-84897699331
fei.scopus.updated2025-02-01
fei.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84897699331&origin=inward

Arquivos

Coleções