Performance of electronic devices submitted to X-rays and high energy proton beams
N/D
Tipo de produção
Artigo de evento
Data de publicação
2012
Texto completo (DOI)
Periódico
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Editor
Texto completo na Scopus
Citações na Scopus
13
Autores
Silveira M.A.G.
Cirne K.H.
Santos R.B.B.
Gimenez S.P.
Medina N.H.
Added N.
Tabacniks M.H.
Barbosa M.D.L.
Seixas L.E.
Melo W.
Orientadores
Resumo
In this work we have studied the radiation effects on MOSFET electronic devices. The integrated circuits were exposed to 10 keV X-ray radiation and 2.6 MeV energy proton beam. We have irradiated MOSFET devices with two different geometries: rectangular-gate transistor and circular-gate transistor. We have observed the cumulative dose provokes shifts on the threshold voltage and increases or decreases the transistor's off-state and leakage current. The position of the trapped charges in modern CMOS technology devices depends on radiation type, dose rate, total dose, applied bias and is a function of device geometry. We concluded the circular-gate transistor is more tolerant to radiation than the rectangular-gate transistor. © 2011 Elsevier B.V. All rights reserved.
Citação
Silveira, M.A.G.; Melo, W.; de Lima, J.A.; Cirne, K.H.; Santos, R.B.B.; Gimenez, S.P.; Medina, N.H.; ADDED, N.; Tabacniks, M.H.; Barbosa, M.D.L.; Seixas, L.E.. Performance of electronic devices submitted to X-rays and high energy proton beams. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms (Print), v. 273, p. 135-138, 2012.
Palavras-chave
Keywords
Electronic devices; MOSFET; Proton beam; Radiation effects; Total ionizing dose (TID); Trapped charge; X-ray
Assuntos Scopus
Applied bias; CMOS technology; Device geometries; Different geometry; Dose rate; Electronic device; High energy proton beams; MeV energy; MOS-FET; Total dose; Total ionizing dose; Trapped charge; X ray radiation