Charge deposition analysis of heavy-ion-induced single-event burnout in low-voltage power VDMOSFET
dc.contributor.advisorOrcid | https://orcid.org/0000-0003-4395-8078 | |
dc.contributor.author | ALBERTON, S. G. | |
dc.contributor.author | AGUIAR, V. A. P. | |
dc.contributor.author | MEDINA, N. H. | |
dc.contributor.author | ADDED, N. | |
dc.contributor.author | MACCHIONE, E. L. A. | |
dc.contributor.author | MENEGASSO, R. | |
dc.contributor.author | CESARIO. G. J. | |
dc.contributor.author | SANTOS, H. C. | |
dc.contributor.author | SCARDUELLI, V. B. | |
dc.contributor.author | ALCANTARA-NUNEZ, J. A. | |
dc.contributor.author | Marcilei Aparecida Guazzelli | |
dc.contributor.author | Roberto Santos | |
dc.contributor.author | FLECHAS, D. | |
dc.contributor.authorOrcid | https://orcid.org/0000-0001-7110-7241 | |
dc.date.accessioned | 2022-10-01T06:03:02Z | |
dc.date.available | 2022-10-01T06:03:02Z | |
dc.date.issued | 2022-10-05 | |
dc.description.abstract | © 2022 Elsevier LtdThe heavy-ion-induced single-event burnout (SEB) risk in power MOSFETs (metal-oxide-semiconductor field-effect transistors) can be assessed in ground facilities, although it is costly and time-demanding. For this reason, there have been few experimental studies dedicated to investigate the relevant parameter related to the description of ion-induced SEB phenomenon. In this work the heavy-ion-induced SEB in a low-voltage power VDMOSFET (vertical double-diffused MOSFET) is studied using several ion-energy combinations. A self-consistent statistical analysis is carried out in order to elucidate the relationship between charge deposition and SEB triggering. Experimental data is compared to a predictive model from the literature for SEE (single-event effect) worst-case prediction in power MOSFETs, supporting for the first time its relevance to the worst-case prediction in the SEB mechanism. | |
dc.description.volume | 137 | |
dc.identifier.citation | ALBERTON, S. G. ALBERTON, S. G.; AGUIAR, V. A. P.; MEDINA, N. H.; ADDED, N.; MACCHIONE, E. L. A.; MENEGASSO, R.; CESARIO. G. J.;SANTOS, H. C.; SCARDUELLI, V. B.; ALCANTARA-NUNEZ, J. A.; GUAZZELLI, M. A.; SANTOS, R.; FLECHAS, D. Charge deposition analysis of heavy-ion-induced single-event burnout in low-voltage power VDMOSFET. Microelectronics Reliability, v. 137, Oct. 2022. | |
dc.identifier.doi | 10.1016/j.microrel.2022.114784 | |
dc.identifier.issn | 0026-2714 | |
dc.identifier.uri | https://repositorio.fei.edu.br/handle/FEI/4589 | |
dc.relation.ispartof | Microelectronics Reliability | |
dc.rights | Acesso Restrito | |
dc.subject.otherlanguage | Charge deposition | |
dc.subject.otherlanguage | Heavy-ion | |
dc.subject.otherlanguage | Power MOSFET | |
dc.subject.otherlanguage | Single-event burnout | |
dc.subject.otherlanguage | Worst-case | |
dc.title | Charge deposition analysis of heavy-ion-induced single-event burnout in low-voltage power VDMOSFET | |
dc.type | Artigo | |
fei.scopus.citations | 4 | |
fei.scopus.eid | 2-s2.0-85138180497 | |
fei.scopus.subject | Bad-case | |
fei.scopus.subject | Charge deposition | |
fei.scopus.subject | Diffused-MOSFET | |
fei.scopus.subject | Ground facilities | |
fei.scopus.subject | Ion energies | |
fei.scopus.subject | Low voltages | |
fei.scopus.subject | Metaloxide semiconductor field-effect transistor (MOSFETs) | |
fei.scopus.subject | Power | |
fei.scopus.subject | Power metal-oxide-semiconductor field-effect transistor | |
fei.scopus.subject | Single-event burnouts | |
fei.scopus.updated | 2025-02-01 | |
fei.scopus.url | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85138180497&origin=inward |