The wave SOI MOSFET: A new accuracy transistor layout to improve drain current and reduce die area for current drivers applications
N/D
Tipo de produção
Artigo de evento
Data de publicação
2009-05-29
Texto completo (DOI)
Periódico
ECS Transactions
Editor
Texto completo na Scopus
Citações na Scopus
17
Autores
Salvador Gimenez
Orientadores
Resumo
This paper proposes a new transistor layout, called here simply as Wave, that can be used for any technology, to improve the current driver and enhanced layout packing with respect to Multifinger and Waffle structures, regarding the same geometric factor Discussions about this novel layout approach are performed regarding matching, avalanche and electro static discharge. To verify the benefits of the Wave structure, a comparison with a Multifinger and Waffle is carried out. Defining a figure-of-merit as integration factor [(W/L)/A], the Wave features a better efficiency than Multifinger and Waffle layouts, as 35.9 % and 28.1% respectively. The Wave approach allows a saving of 26.1 % and 21.8% in the power SOI MOSFET size as compared to Multifinger and Waffle layouts. ©The Electrochemical Society.
Citação
GIMENEZ, S. The wave SOI MOSFET: A new accuracy transistor layout to improve drain current and reduce die area for current drivers applications. ECS Transactions, v. 19, n. 4, p. 153-158, Mayo 2009.
Palavras-chave
Keywords
Assuntos Scopus
Current drivers; Die area; Figure of merit; Geometric factors; Integration factor; Multifingers; SOI-MOSFETs; Wave approach; Wave features; Wave structures