Experimental validation of the drain current analytical model of the fully depleted diamond SOI nMOSFETs by using paired t-test statistical evaluation
dc.contributor.author | PERUZZI, V. V. | |
dc.contributor.author | RENAUX, C. | |
dc.contributor.author | FLANDRE, D. | |
dc.contributor.author | Salvador Gimenez | |
dc.contributor.authorOrcid | https://orcid.org/0000-0002-3616-9559 | |
dc.date.accessioned | 2022-01-12T22:02:44Z | |
dc.date.available | 2022-01-12T22:02:44Z | |
dc.date.issued | 2012-09-02 | |
dc.description.abstract | The focus of this work is to validate the drain current analytical model of the Fully Depleted Diamond SOI nMOSFETs, by applying the paired t-test statistical evaluation with experimental data of the six different samples of integrated circuits containing different Diamond SOI MOSFETs and Conventional ones counterparts. Two parameters are considered in this work: maximum transconductance and saturation drain current. We observe that, for the most cases (worst case is around 85% of the repeatability for the saturation drain current), the Diamond drain current analytical model is capable to reproduce a similar statistical behavior than the one observed for the conventional SOI nMOSFET counterpart, considering the same bias conditions and SOI CMOS manufacturing process of the integrated circuits. © The Electrochemical Society. | |
dc.description.firstpage | 169 | |
dc.description.issuenumber | 1 | |
dc.description.lastpage | 176 | |
dc.description.volume | 49 | |
dc.identifier.citation | PERUZZI, V. V.; RENAUZ, C.; RENAUX, C.; FLANDRE, D. GIMEMEZ, S. Experimental validation of the drain current analytical model of the fully depleted diamond SOI nMOSFETs by using paired t-test statistical evaluation. ECS Transactions, v. 49, n. 1, p. 169-176, Sept. 2012. | |
dc.identifier.doi | 10.1149/04901.0169ecst | |
dc.identifier.issn | 1938-6737 | |
dc.identifier.uri | https://repositorio.fei.edu.br/handle/FEI/4156 | |
dc.relation.ispartof | ECS Transactions | |
dc.rights | Acesso Restrito | |
dc.title | Experimental validation of the drain current analytical model of the fully depleted diamond SOI nMOSFETs by using paired t-test statistical evaluation | |
dc.type | Artigo de evento | |
fei.scopus.citations | 1 | |
fei.scopus.eid | 2-s2.0-84875859570 | |
fei.scopus.subject | Bias conditions | |
fei.scopus.subject | Experimental validations | |
fei.scopus.subject | Fully depleted | |
fei.scopus.subject | Maximum transconductance | |
fei.scopus.subject | Saturation drain current | |
fei.scopus.subject | Statistical behavior | |
fei.scopus.subject | Statistical evaluation | |
fei.scopus.subject | Two parameter | |
fei.scopus.updated | 2024-07-01 | |
fei.scopus.url | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84875859570&origin=inward |