Repositório do Conhecimento Institucional do Centro Universitário FEI
 

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URI permanente para esta coleçãohttps://repositorio.fei.edu.br/handle/FEI/798

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  • Artigo 8 Citação(ões) na Scopus
    Study of matching properties of graded-channel SOI MOSFETs
    (2008-01-05) Michelly De Souza; FLANDRE, D.; Marcelo Antonio Pavanello
    In this paper an overall analysis on the matching properties of Graded-Channel (GC) SOI MOSFETs in comparison to conventional SOI transistors is performed. Experimental results show that GC devices present poorer matching behavior in comparison to conventional SOI counterpart for equal mask channel length, whereas for same effective channel length, almost the same matching behavior. The analytical model for the drain current of GC devices is used to investigate the reasons for this matching worsening. Two-dimensional numerical simulations are used to validate the model-based analysis both in linear and saturation regions.
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    Artigo 2 Citação(ões) na Scopus
    Performance of SOI Ω-Gate Nanowires from Cryogenic to High Temperatures
    (2022-09-17) Marcelo Antonio Pavanello; Michelly De Souza
    © 2022, Brazilian Microelectronics Society. All rights reserved.—This review paper presents the electrical characteristics of Silicon-On-Insulator Ω-Gate nanowires in a wide range of temperatures. The operation in cryogenic and high-temperature environments will be experimentally explored. The influence of nanowire width and channel length will be dis-cussed. Nanowires with and without strain will be investigated from room temperature down to cryogenic ones, showing that strained nanowires improve carrier mobility in the whole temperature range. At high temperatures, it is demonstrated that nanowires can operate successfully up to 580 K, maintaining the ideal body factor. The effect of high temperatures on Gate-In-duced Drain Leakage will also be studied. The experimental re-sults in the whole temperature range confirm that SOI nan-owires are an excellent alternative for FinFET replacement in future technological nodes.