Please use this identifier to cite or link to this item: https://repositorio.fei.edu.br/handle/FEI/1067
Title: Evaluation of triple-gate FinFETs with SiO2-HfO2-TiN gate stack under analog operation
Authors: PAVANELLO, Marcelo A.
MARTINO, João Antonio
SIMOEN, Eddy
ROOYACKERS, Rita
COLLAERT, Nadine
CLAEYS, Cor
Issue Date: 2007
Journal: Solid-State Electronics
ISSN: 0038-1101
Citation: PAVANELLO, Marcelo A.; MARTINO, João Antonio; SIMOEN, Eddy; ROOYACKERS, Rita; COLLAERT, Nadine; CLAEYS, Cor. Evaluation of triple-gate FinFETs with SiO2-HfO2-TiN gate stack under analog operation. Solid-State Electronics, v. 51, n. 2, p. 285-291, 2007.
Access Type: Acesso Aberto
DOI: 10.1016/j.sse.2007.01.012
URI: https://repositorio.fei.edu.br/handle/FEI/1067
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