Engenharia Elétrica
URI permanente desta comunidadehttps://repositorio.fei.edu.br/handle/FEI/21
Navegar
13 resultados
Resultados da Pesquisa
Artigo 8 Citação(ões) na Scopus Study of matching properties of graded-channel SOI MOSFETs(2008-01-05) Michelly De Souza; FLANDRE, D.; Marcelo Antonio PavanelloIn this paper an overall analysis on the matching properties of Graded-Channel (GC) SOI MOSFETs in comparison to conventional SOI transistors is performed. Experimental results show that GC devices present poorer matching behavior in comparison to conventional SOI counterpart for equal mask channel length, whereas for same effective channel length, almost the same matching behavior. The analytical model for the drain current of GC devices is used to investigate the reasons for this matching worsening. Two-dimensional numerical simulations are used to validate the model-based analysis both in linear and saturation regions.Artigo 17 Citação(ões) na Scopus Analog operation temperature dependence of nMOS junctionless transistors focusing on harmonic distortion(2011-09-05) Rodrigo Doria; Marcelo Antonio Pavanello; TREVISOLI, R. D.; Michelly De Souza; LEE, C.-W.; FERAIN, I.; AKHAVAN, N. D.; YAN, R.; RAZAVI, P.; YU, R.; FRANTI, A.; COLINGE, J-P.This paper performs a comparative study of the analog performance of Junctionless Nanowire Transistors (JNTs) and classical Trigate inversion mode (IM) devices focusing on the harmonic distortion. The study has been carried out in the temperature range of 223 K up to 473 K. The non-linearity or harmonic distortion (HD) has been evaluated in terms of the total and the third order distortions (THD and HD3, respectively) at a fixed input bias and at a targeted output swing. Several parameters important for the HD evaluation have also been observed such as the transconductance to the drain current ratio (gm/IDS), the Early voltage (VEA) and the intrinsic voltage gain (AV). Trigate devices showed maximum AV around room temperature whereas in JNTs the intrinsic voltage gain increases with the temperature. Due to the different AV characteristics, Junctionless transistors present improved HD at higher temperatures whereas inversion mode Trigate devices show better HD properties at room temperature.When both devices are compared, Junctionless transistors present better THD and HD3 with respect to the IM Trigate devices.Artigo 16 Citação(ões) na Scopus Temperature and silicon film thickness influence on the operation of lateral SOI PIN photodiodes for detection of short wavelengths(2011-09-05) Michelly De Souza; BULTEEL, O.; FLANDRE, D.; Marcelo Antonio PavanelloThis work presents an analysis of the temperature influence on the performance of a lateral thin-film SOI PIN photodiodes when illuminated by low wavelengths, in the range of blue and ultra-violet (UV). Experimental measurements performed from 100K to 400K showed that the optical responsitivity of SOI PIN photodetectors is affected by temperature change, being reduced at low and moderately high temperatures. Two-dimensional numerical simulations showed the same trends as in the experimental results, and were used both to investigate the physical phenomena responsible for the observed behavior as a function of the temperature as well as to predict the influence of silicon film thickness downscaling on the photodetector performance.- Comparative of analog performance of transcapacitances in asymmetric self-cascode and graded-channel SOI nMOSFETs(2023-01-04) ALVES, C. R.; Michelly De Souza© 2023, The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature.This work presents a comparative study of the transcapacitances of an asymmetric self-cascode (A-SC) and graded-channel (GC) silicon-on-insulator (SOI) nMOSFETs with different gate lengths. This analysis was done by means of two-dimensional numerical simulations. Simulated results show the influence of others transcapacitances on the gate-to-gate capacitance for the ASC SOI device and the GC SOI device.
- Analysis of Capacitances in Asymmetric SelfCascode SOI nMOSFETs(2021-08-27) ALVES, C.R.; D' OLIVEIRA, L. M.; Michelly De Souza©2021 IEEE.This work presents a study of the capacitance of asymmetric self-cascode silicon-on-insulator (ASC SOI) MOSFETs with similar gate areas and different gate lengths. Experimental results of total gate capacitance of different ASC are presented and complemented with the results of twodimensional simulations. The transcapacitances are explored through two-dimensional simulations. Results show that different channel lengths of the composite transistors have more influence in the depletion region of the capacitance curves for low VDS. The gate-source and gate-drain capacitances show opposite trends with the change in the lengths of source and drain transistors, despite of the VDS applied.
- Impact of the twin-gate structure on the linear kink effect in PD SOI nMOSFETS(2006-08-05) AGOPIAN, P. G. D.; MARTINO, J. A.; SIMOEN, E.; CLAEYS, C.In this work, the influence of the twin-gate structure on the gate-induced floating body effects in thin gate oxide partially depleted (PD) silicon-on-insulator (SOI) nMOSFETs is investigated through two-dimensional numerical simulations, which are validated by experimental results. The asymmetric behavior of the body potential with the interchange of the master and slave transistor of the twin-gate structure will be shown, as well as the relation between the total resistance and the effective mobility degradation factor. It will be demonstrated that a similar reduction of the linear kink effect is obtained in a twin-gate structure and in a conventional SOI transistor with an external resistance in series. © 2006 Elsevier Ltd. All rights reserved.
- On the Application of Junctionless Nanowire Transistors in Basic Analog Building Blocks(2021-01-05) Michelly De Souza; DORIA, R.T.; TREVISOLI, R.; BARRAUD, S.; Marcelo Antonio PavanelloIn this work an evaluation of analog building blocks using junctionless nanowire transistors is presented. This analysis has been carried out through experimental measurements of junctionless nMOS transistors configured as two amplifier stages composed by single transistors, namely the common-source and the common-drain amplifiers. The performance of junctionless devices is evaluated as a function of channel length, nanowire width, doping concentration and bias condition, taking as figures of merit the voltage gain, linearity and, in the case of the common drain amplifier, the input voltage range. The obtained results indicate that these two basic analog blocks can be benefitted by the use of junctionless devices, providing nearly ideal voltage gain when configured as common-drain amplifier, and improvement on voltage gain and linearity with device narrowing in the case of the common-source amplifier.
- Low-frequency noise of n-type triple gate FinFETs fabricated on standard and 45 rotated substrates(2013) Doria R.T.; Martino J.A.; Simoen E.; Claeys C.; Pavanello M.A.This paper studies the impact of the 45 substrate rotation on the low-frequency noise (LFN) of triple gate nFinFETs. The overall LFN has been extracted for both standard and 45 substrate rotated devices of several fin widths at different drain and gate voltage biases focusing on their operation in saturation regime. A general view of the mechanisms which govern the low-frequency noise in MOS devices is provided and a brief discussion on the physical origins of the LFN in the evaluated devices is carried out. It has been noted that the LFN in non-rotated (0 rotated) and 45 rotated devices operating in the linear regime shows 1/f behavior independent on the gate bias, whereas in the saturation regime both 1/f and Lorentzian (1/f2) noises are observed. The former one prevails at lower frequencies and the 1/f2 noise at higher ones. In this case, the corner frequency shows an exponential dependence on the gate bias. © 2013 Elsevier Ltd. All rights reserved.
- Harmonic distortion analysis of double gate graded-channel MOSFETs operating in saturation(2008) Doria R.T.; Cerdeira A.; Raskin J.-P.; Flandre D.; Pavanello M.A.In this work we present an analysis of harmonic distortion (HD) in graded-channel (GC) gate-all-around (GAA) devices operating in saturation region for analog applications. The study has been performed through device characterization and two-dimensional process and device simulations. The overall study has been done on the total and third order HDs. When applied in the saturation regime as an amplifier, the GC outperforms conventional GAA transistors presenting simultaneously higher transconductance, lower drain output conductance and more than 15 dB improved linearity. The influence of channel length reduction on the HD is also analyzed. Although slight linearity degradation is observed in both the conventional and the GC devices when reducing the channel length, the HD presented by the GC transistor is significantly lower than the one showed by conventional device for any studied channel length. This allows AC input signal amplitude up to 20 times higher than the conventional GAA for a same specified distortion level. © 2008 Elsevier Ltd. All rights reserved.
- Harmonic distortion of 2-MOS structures for MOSFET-C filters implemented with n-type unstrained and strained FINFETS(2011) Doria R.T.; Simoen E.; Claeys C.; Martino J.A.; Pavanello M.A.This work investigates the harmonic distortion (HD) in 2-MOS balanced structures composed of triple gate FinFETs. HD has been evaluated through the determination of the third-order harmonic distortion (HD3), since this represents the major non-linearity source in balanced structures. The 2-MOS structures with devices of different channel lengths (L) and fin widths (W fin) have been studied operating in the linear region as tunable resistors. The analysis was performed as a function of the gate voltage, aiming to verify the correlation between operation bias and HD3. The physical origins of the non-linearities have been investigated and are pointed out. Being a resistive circuit, the 2-MOS structure is generally projected for a targeted on-resistance, which has also been evaluated in terms of HD3. The impact of the application of biaxial strain has been studied for FinFETs of different dimensions. It has been noted that HD3 reduces with the increase of the gate bias for all the devices and this reduction is more pronounced both in narrower and in longer devices. Also, the presence of strain slightly diminishes the non-linearity at a similar bias. However, a drawback associated with the use of strain engineering consists in a significant reduction of the on-resistance with respect to unstrained devices. © 2011 Elsevier Ltd. All rights reserved.